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Roughness-induced domain structure in perpendicular Co/Ni multilayers

Autor(en)
Nicholas R. Lee-Hone, R. Thanhoffer, V. Neu, R. Schäfer, Monika Arora, R. Hübner, Dieter Süss, D. M. Broun, Erol Girt
Abstrakt

We investigate the correlation between roughness, remanence and coercivity in Co/Ni films grown on Cu seed layers of varying thickness. Increasing the Cu seed layer thickness of Ta/Cu/8×[Co/Ni] thin films increases the roughness of the films. In-plane magnetization loops show that both the remanence and coercivity increase with increasing seed layer roughness. Polar Kerr microscopy and magnetic force microscopy reveal that the domain density also increases with roughness. Finite element micromagnetic simulations performed on structures with periodically modulated surfaces provide further insight. They confirm the connection between domain density and roughness, and identify the microsocpic structure of the domain walls as the source of the increased remanence in rough films. The simulations predict that the character of the domain walls changes from Bloch-like in smooth films to Néel-like for rougher films.

Organisation(en)
Physik Funktioneller Materialien
Externe Organisation(en)
Simon Fraser University, Universität Wien, Leibniz-Institut für Festkörper- und Werkstoffforschung Dresden, Helmholtz-Zentrum Dresden-Rossendorf
Journal
Journal of Magnetism and Magnetic Materials
Band
441
Seiten
283-289
Anzahl der Seiten
7
ISSN
0304-8853
DOI
https://doi.org/10.1016/j.jmmm.2017.05.051
Publikationsdatum
11-2017
Peer-reviewed
Ja
ÖFOS 2012
205004 Funktionsmaterialien
Schlagwörter
ASJC Scopus Sachgebiete
Electronic, Optical and Magnetic Materials, Condensed Matter Physics
Link zum Portal
https://ucrisportal.univie.ac.at/de/publications/fb97e1de-e1dc-43eb-aa9a-3e4325f37b51