Controlled assembly of graphene-capped nickel, cobalt and iron silicides

Autor(en)

O. Vilkov, A. Fedorov, D. Usachov, L. V. Yashina, A. V. Generalov, K. Borygina, N. I. Verbitskiy, Alexander Grüneis, D. V. Vyalikh

Abstrakt

The unique properties of graphene have raised high expectations regarding its application in carbon-based nanoscale devices that could complement or replace traditional silicon technology. This gave rise to the vast amount of researches on how to fabricate high-quality graphene and graphene nanocomposites that is currently going on. Here we show that graphene can be successfully integrated with the established metal-silicide technology. Starting from thin monocrystalline films of nickel, cobalt and iron, we were able to form metal silicides of high quality with a variety of stoichiometries under a Chemical Vapor Deposition grown graphene layer. These graphene-capped silicides are reliably protected against oxidation and can cover a wide range of electronic materials/device applications. Most importantly, the coupling between the graphene layer and the silicides is rather weak and the properties of quasi-freestanding graphene are widely preserved.

Organisation(en)

Elektronische Materialeigenschaften

Externe Organisation(en)

Saint Petersburg State University, Technische Universität Dresden, Lomonosov Moscow State University (MSU), Leibniz-Institut für Festkörper- und Werkstoffforschung Dresden

Journal

Scientific Reports

Band

3

Anzahl der Seiten

7

ISSN

2045-2322

DOI

https://doi.org/10.1038/srep02168

Publikationsdatum

07-2013

Peer-reviewed

Ja

ÖFOS 2012

103020 Oberflächenphysik, 103009 Festkörperphysik, 103018 Materialphysik

Schlagwörter

Link zum Portal

https://ucrisportal.univie.ac.at/de/publications/f70470ae-87fd-4b59-9cc7-125848d235e7