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Controlled assembly of graphene-capped nickel, cobalt and iron silicides

Autor(en)
O. Vilkov, A. Fedorov, D. Usachov, L. V. Yashina, A. V. Generalov, K. Borygina, N. I. Verbitskiy, Alexander Grüneis, D. V. Vyalikh
Abstrakt

The unique properties of graphene have raised high expectations regarding its application in carbon-based nanoscale devices that could complement or replace traditional silicon technology. This gave rise to the vast amount of researches on how to fabricate high-quality graphene and graphene nanocomposites that is currently going on. Here we show that graphene can be successfully integrated with the established metal-silicide technology. Starting from thin monocrystalline films of nickel, cobalt and iron, we were able to form metal silicides of high quality with a variety of stoichiometries under a Chemical Vapor Deposition grown graphene layer. These graphene-capped silicides are reliably protected against oxidation and can cover a wide range of electronic materials/device applications. Most importantly, the coupling between the graphene layer and the silicides is rather weak and the properties of quasi-freestanding graphene are widely preserved.

Organisation(en)
Elektronische Materialeigenschaften
Externe Organisation(en)
Saint Petersburg State University, Technische Universität Dresden, Lomonosov Moscow State University (MSU), Leibniz-Institut für Festkörper- und Werkstoffforschung Dresden
Journal
Scientific Reports
Band
3
Anzahl der Seiten
7
ISSN
2045-2322
DOI
https://doi.org/10.1038/srep02168
Publikationsdatum
07-2013
Peer-reviewed
Ja
ÖFOS 2012
103020 Oberflächenphysik, 103009 Festkörperphysik, 103018 Materialphysik
Schlagwörter
Link zum Portal
https://ucrisportal.univie.ac.at/de/publications/f70470ae-87fd-4b59-9cc7-125848d235e7