Die u:cris Detailansicht:
Controlled assembly of graphene-capped nickel, cobalt and iron silicides
- Autor(en)
- O. Vilkov, A. Fedorov, D. Usachov, L. V. Yashina, A. V. Generalov, K. Borygina, N. I. Verbitskiy, Alexander Grüneis, D. V. Vyalikh
- Abstrakt
The unique properties of graphene have raised high expectations regarding its application in carbon-based nanoscale devices that could complement or replace traditional silicon technology. This gave rise to the vast amount of researches on how to fabricate high-quality graphene and graphene nanocomposites that is currently going on. Here we show that graphene can be successfully integrated with the established metal-silicide technology. Starting from thin monocrystalline films of nickel, cobalt and iron, we were able to form metal silicides of high quality with a variety of stoichiometries under a Chemical Vapor Deposition grown graphene layer. These graphene-capped silicides are reliably protected against oxidation and can cover a wide range of electronic materials/device applications. Most importantly, the coupling between the graphene layer and the silicides is rather weak and the properties of quasi-freestanding graphene are widely preserved.
- Organisation(en)
- Elektronische Materialeigenschaften
- Externe Organisation(en)
- Saint Petersburg State University, Technische Universität Dresden, Lomonosov Moscow State University (MSU), Leibniz-Institut für Festkörper- und Werkstoffforschung Dresden
- Journal
- Scientific Reports
- Band
- 3
- Anzahl der Seiten
- 7
- ISSN
- 2045-2322
- DOI
- https://doi.org/10.1038/srep02168
- Publikationsdatum
- 07-2013
- Peer-reviewed
- Ja
- ÖFOS 2012
- 103020 Oberflächenphysik, 103009 Festkörperphysik, 103018 Materialphysik
- Schlagwörter
- Link zum Portal
- https://ucrisportal.univie.ac.at/de/publications/f70470ae-87fd-4b59-9cc7-125848d235e7