Modeling and analysis of sulfur hexafluoride plasma etching for silicon microcavity resonators

Autor(en)

Luiz Felipe Aguinsky, Georg Wachter, Paul Manstetten, Francio Rodrigues, Michael Trupke, Ulrich Schmid, Andreas Hössinger, Josef Weinbub

Organisation(en)

Quantenoptik, Quantennanophysik und Quanteninformation

Externe Organisation(en)

Technische Universität Wien, Silvaco Europe Ltd, Vienna Center for Quantum Science and Technology (VCQ)

Journal

Journal of Micromechanics and Microengineering

Band

31

Anzahl der Seiten

9

ISSN

0960-1317

DOI

https://doi.org/10.1088/1361-6439/ac2bad

Publikationsdatum

12-2021

Peer-reviewed

Ja

ÖFOS 2012

103026 Quantenoptik, 102009 Computersimulation

Schlagwörter

ASJC Scopus Sachgebiete

Electronic, Optical and Magnetic Materials, Mechanics of Materials, Mechanical Engineering, Electrical and Electronic Engineering

Link zum Portal

https://ucrisportal.univie.ac.at/de/publications/b3ef3ec7-b6a2-4e1a-a7c0-b4e8548b63de