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Nucleation Control for Large, Single Crystalline Domains of Mono layer Hexagonal Boron Nitride via Si-Doped Fe Catalysts

Autor(en)
Sabina Caneva, Robert S. Weatherup, Bernhard C. Bayer, Barry Brennan, Steve J. Spencer, Ken Mingard, Andrea Cabrero-Vilatela, Carsten Baehtz, Andrew J. Pollard, Stephan Hofmann
Abstrakt

The scalable chemical vapor deposition of monolayer hexagonal boron nitride (h-BN) single crystals, with lateral dimensions of similar to 0.3 mm, and of continuous h-BN monolayer films With large domain sizes (>25 mu m) is demonstrated via an admixture of Si to Fe catalyst films. A simple thin-filth Fe/'SiO2/Si catalyst system is used to show that controlled Si diffusion into the Fe catalyst allows exclusive nucleation of monolayer h-BN with very low nucleation densities upon exposure to undiluted borazine. Our systematic in situ and ex situ characterization of this catalyst system establishes, a basis for further rational catalyst design for compound 2D materials.

Organisation(en)
Physik Nanostrukturierter Materialien
Externe Organisation(en)
University of Cambridge, Helmholtz-Zentrum Dresden-Rossendorf, National Physical Laboratory
Journal
Nano Letters: a journal dedicated to nanoscience and nanotechnology
Band
15
Seiten
1867-1875
Anzahl der Seiten
9
ISSN
1530-6984
DOI
https://doi.org/10.1021/nl5046632
Publikationsdatum
03-2015
Peer-reviewed
Ja
ÖFOS 2012
210006 Nanotechnologie, 103018 Materialphysik
Schlagwörter
ASJC Scopus Sachgebiete
Condensed Matter Physics, Mechanical Engineering, Bioengineering, Allgemeine Chemie, Allgemeine Materialwissenschaften
Link zum Portal
https://ucrisportal.univie.ac.at/de/publications/7617d54c-98f0-42cd-975d-c728b24814d8