Die u:cris Detailansicht:
Nucleation Control for Large, Single Crystalline Domains of Mono layer Hexagonal Boron Nitride via Si-Doped Fe Catalysts
- Autor(en)
- Sabina Caneva, Robert S. Weatherup, Bernhard C. Bayer, Barry Brennan, Steve J. Spencer, Ken Mingard, Andrea Cabrero-Vilatela, Carsten Baehtz, Andrew J. Pollard, Stephan Hofmann
- Abstrakt
The scalable chemical vapor deposition of monolayer hexagonal boron nitride (h-BN) single crystals, with lateral dimensions of similar to 0.3 mm, and of continuous h-BN monolayer films With large domain sizes (>25 mu m) is demonstrated via an admixture of Si to Fe catalyst films. A simple thin-filth Fe/'SiO2/Si catalyst system is used to show that controlled Si diffusion into the Fe catalyst allows exclusive nucleation of monolayer h-BN with very low nucleation densities upon exposure to undiluted borazine. Our systematic in situ and ex situ characterization of this catalyst system establishes, a basis for further rational catalyst design for compound 2D materials.
- Organisation(en)
- Physik Nanostrukturierter Materialien
- Externe Organisation(en)
- University of Cambridge, Helmholtz-Zentrum Dresden-Rossendorf, National Physical Laboratory
- Journal
- Nano Letters: a journal dedicated to nanoscience and nanotechnology
- Band
- 15
- Seiten
- 1867-1875
- Anzahl der Seiten
- 9
- ISSN
- 1530-6984
- DOI
- https://doi.org/10.1021/nl5046632
- Publikationsdatum
- 03-2015
- Peer-reviewed
- Ja
- ÖFOS 2012
- 210006 Nanotechnologie, 103018 Materialphysik
- Schlagwörter
- ASJC Scopus Sachgebiete
- Condensed Matter Physics, Mechanical Engineering, Bioengineering, Allgemeine Chemie, Allgemeine Materialwissenschaften
- Link zum Portal
- https://ucrisportal.univie.ac.at/de/publications/7617d54c-98f0-42cd-975d-c728b24814d8