Nucleation Control for Large, Single Crystalline Domains of Mono layer Hexagonal Boron Nitride via Si-Doped Fe Catalysts

Autor(en)

Sabina Caneva, Robert S. Weatherup, Bernhard C. Bayer, Barry Brennan, Steve J. Spencer, Ken Mingard, Andrea Cabrero-Vilatela, Carsten Baehtz, Andrew J. Pollard, Stephan Hofmann

Abstrakt

The scalable chemical vapor deposition of monolayer hexagonal boron nitride (h-BN) single crystals, with lateral dimensions of similar to 0.3 mm, and of continuous h-BN monolayer films With large domain sizes (>25 mu m) is demonstrated via an admixture of Si to Fe catalyst films. A simple thin-filth Fe/'SiO2/Si catalyst system is used to show that controlled Si diffusion into the Fe catalyst allows exclusive nucleation of monolayer h-BN with very low nucleation densities upon exposure to undiluted borazine. Our systematic in situ and ex situ characterization of this catalyst system establishes, a basis for further rational catalyst design for compound 2D materials.

Organisation(en)

Physik Nanostrukturierter Materialien

Externe Organisation(en)

University of Cambridge, Helmholtz-Zentrum Dresden-Rossendorf, National Physical Laboratory

Journal

Nano Letters: a journal dedicated to nanoscience and nanotechnology

Band

15

Seiten

1867-1875

Anzahl der Seiten

9

ISSN

1530-6984

DOI

https://doi.org/10.1021/nl5046632

Publikationsdatum

03-2015

Peer-reviewed

Ja

ÖFOS 2012

210006 Nanotechnologie, 103018 Materialphysik

Schlagwörter

ASJC Scopus Sachgebiete

Condensed Matter Physics, Mechanical Engineering, Bioengineering, Allgemeine Chemie, Allgemeine Materialwissenschaften

Link zum Portal

https://ucrisportal.univie.ac.at/de/publications/7617d54c-98f0-42cd-975d-c728b24814d8