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Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors

Autor(en)
J. Provine, Peter Schindler, Jan Torgersen, Hyo Jin Kim, Hans-Peter Karnthaler, Fritz B. Prinz
Abstrakt

Tetrakisdimethylamido (TDMA) based precursors are commonly used to deposit metal oxides such as TiO2, ZrO2, and HfO2 by means of chemical vapor deposition and atomic layer deposition (ALD). Both thermal and plasma enhanced ALD (PEALD) have been demonstrated with TDMA-metal precursors. While the reactions of TDMA-type precursors with water and oxygen plasma have been studied in the past, their reactivity with pure O-2 has been overlooked. This paper reports on experimental evaluation of the reaction of molecular oxygen (O-2) and several metal organic precursors based on TDMA ligands. The effect of O-2 exposure duration and substrate temperature on deposition and film morphology is evaluated and compared to thermal reactions with H2O and PEALD with O-2 plasma.

Organisation(en)
Physik Nanostrukturierter Materialien
Externe Organisation(en)
Stanford University
Journal
Journal of vacuum science & technology a
Band
34
Anzahl der Seiten
5
ISSN
0734-2101
DOI
https://doi.org/10.1116/1.4937991
Publikationsdatum
01-2016
Peer-reviewed
Ja
ÖFOS 2012
103018 Materialphysik
Schlagwörter
ASJC Scopus Sachgebiete
Condensed Matter Physics, Surfaces, Coatings and Films, Surfaces and Interfaces
Link zum Portal
https://ucrisportal.univie.ac.at/de/publications/6f1dc401-aa86-41ce-809d-e36c87998bb7