The simultaneous enhancement of photorefraction and optical damage resistance in MgO and Bi2O3 co-doped LiNbO3 crystals

Autor(en)

Dahuai Zheng, Yongfa Kong, Shiguo Liu, Muling Chen, Shaolin Chen, Ling Zhang, Romano Rupp, Jingjun Xu

Abstrakt

For a long time that optical damage was renamed as photorefraction, here we find that the optical damage resistance and photorefraction can be simultaneously enhanced in MgO and Bi2O3 co-doped LiNbO3 (LN:Bi,Mg). The photorefractive response time of LN:Bi, Mg was shortened to 170 ms while the photorefractive sensitivity reached up to 21 cm(2)/J. Meanwhile, LN:Bi, Mg crystals could withstand a light intensity higher than 10(6) W/cm(2) without apparent optical damage. Our experimental results indicate that photorefraction doesn't equal to optical damage. The underground mechanism was analyzed and attributed to that diffusion dominates the transport process of charge carriers, that is to say photorefraction causes only slight optical damage under diffusion mechanism, which is very important for the practical applications of photorefractive crystals, such as in holographic storage, integrated optics and 3D display.

Organisation(en)

Physik Funktioneller Materialien

Externe Organisation(en)

Nankai University, Collaborative Innovation Center of Chemical Science and Engineering (Tianjin)

Journal

Scientific Reports

Band

6

Anzahl der Seiten

7

ISSN

2045-2322

DOI

https://doi.org/10.1038/srep20308

Publikationsdatum

02-2016

Peer-reviewed

Ja

ÖFOS 2012

103021 Optik, 103018 Materialphysik

Schlagwörter

Link zum Portal

https://ucrisportal.univie.ac.at/de/publications/36415585-c2c6-46b4-a0b0-7865107228d0