Indirect measurement of the carbon adatom migration barrier on graphene

Autor(en)

Andreas Postl, Pit Pascal Patrick Hilgert, Alexander Markevich, Jacob Madsen, Kimmo Mustonen, Jani Kotakoski, Toma Susi

Abstrakt

Although surface diffusion is critical for many physical and chemical processes, including the epitaxial growth of crystals and heterogeneous catalysis, it is particularly challenging to directly study. Here, we estimate the carbon adatom migration barrier on freestanding monolayer graphene by quantifying its temperature-dependent electron knock-on damage. Due to the fast healing of vacancies by diffusing adatoms, the damage rate decreases with increasing temperature. By analyzing the observed damage rates at 300-1073 K using a model describing our finite scanning probe, we find a barrier of (0.33 & PLUSMN; 0.03) eV.

Organisation(en)

Physik Nanostrukturierter Materialien

Journal

Carbon

Band

196

Seiten

596-601

Anzahl der Seiten

6

ISSN

0008-6223

DOI

https://doi.org/10.1016/j.carbon.2022.05.039

Publikationsdatum

05-2022

Peer-reviewed

Ja

ÖFOS 2012

103042 Elektronenmikroskopie, 103018 Materialphysik

Schlagwörter

ASJC Scopus Sachgebiete

Allgemeine Chemie, Allgemeine Materialwissenschaften

Link zum Portal

https://ucrisportal.univie.ac.at/de/publications/1da76248-0c70-422e-8b61-f6ecf5ad55b6