Field-assisted oxidation of rhodium

Autor(en)

Jean-Sabin Mc Ewen, P. Gaspard, Florian Mittendorfer, Thierry Visart de Bocarme, Norbert Kruse

Abstrakt

The oxidation of nanosized rhodium facets is investigated in the presence of a high external electric field with field ion microscopy experiments (FIM). Corresponding density functional theory (DFT) calculations were done on Rh(0 0 1), Rh(0 1 1) and Rh(1 1 1). A cross-like granular structure is obtained with FIM when the electric field is increased from 11 to 12.3 V/nm, which strongly indicates that the field promotes the oxidation of the tip. The DFT calculations confirm this scenario with a corresponding reduction of the activation barrier for oxygen incorporation into the surface of an oxide layer. © 2007 Elsevier B.V. All rights reserved

Organisation(en)

Computergestützte Materialphysik

Externe Organisation(en)

Vrije Universiteit Brussel

Journal

Chemical Physics Letters

Band

452

Seiten

133-138

Anzahl der Seiten

6

ISSN

0009-2614

DOI

https://doi.org/10.1016/j.cplett.2007.12.031

Publikationsdatum

2008

Peer-reviewed

Ja

ÖFOS 2012

1030 Physik, Astronomie

Link zum Portal

https://ucrisportal.univie.ac.at/de/publications/00dc145c-ab68-423a-bf86-ca44ff0ecb0e